Hokyun Cho

Hokyun is a partner and patent attorney at FirstLaw PC, which he joined in 2002. He received his undergraduate degree in material science and engineering from Seoul National University in 1995. Hokyun obtained his JD degree at the Washington University in St. Louis School of Law in 2012.

As a member of the Korean Patent Bar and the New York State Bar, Hokyun has provided advice on all aspects of intellectual property law for leading Japanese and US companies. In particular, he has extensive experience in advising semiconductor and high-tech industry clients on patent procurement at home and abroad, and patent analysis such as validity, infringement, and freedom-to-operate analysis.

Hokyun's area of technical expertise covers various aspects of material engineering, including metallurgy, semiconductor engineering, polymer science, optics and mechanical engineering.

He is a member of the Korea Patent Attorneys Association (KPAA) and the Asian Patent Attorneys Association (APAA). Hokyun served as director of international affairs of the KPAA in 2016 and 2017. He is fluent in Japanese, English and Korean.